Influence of Domain Structure in Ferroelectric Substrate on Graphene Conductance (Authors' Review)

  • M. V. Strikha V.Lashkariov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine (pr. Nauky 41, 03028 Kyiv, Ukraine)
  • A. I. Kurchak Taras Shevchenko Kyiv National University, Radiophysical Faculty (pr. Akademika Hlushkova 4g, 03022 Kyiv, Ukraine)
  • A. N. Morozovska Institute of Physics, National Academy of Sciences of Ukraine (46, Prosp. Nauky, Kyiv 03028, Ukraine)


Review is devoted to the recent theoretical studies of the impact of domain structure of ferroelectric substrate on graphene conductance. An analytical description of the hysteresis memory effect in a field effect transistor based on graphene-on-ferroelectric, taking into account absorbed dipole layers on the free surface of graphene and localized states on its interfaces is considered. The aspects of the recently developed theory of p-n junctions conductivity in a graphene channel on a ferroelectric substrate, which are created by a 180-degree ferroelectric domain structure, are analyzed, and cases of different current regimes from ballistic to diffusion one are considered. The influence of size effects in such systems and the possibility of using the results for improving the characteristics of field effect transistors with a graphene channel, non-volatile ferroelectric memory cells with random access, sensors, as well as for miniaturization of various devices of functional nanoelectronics are discussed.

Keywords graphene-on-ferroelectric, domain structure, conductance, field effect transistor


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How to Cite
Strikha, M., Kurchak, A., & Morozovska, A. (2018). Influence of Domain Structure in Ferroelectric Substrate on Graphene Conductance (Authors' Review). Ukrainian Journal Of Physics, 63(1), 49-69. Retrieved from
Semiconductors and dielectrics