Surface Stresses at the Initial Steps of the GexSi1−x/Si(001) Surface Oxidation
DOI:
https://doi.org/10.15407/ujpe59.02.0148Keywords:
stress, stress anisotropy, oxidationAbstract
Elastic stresses arising at the clean GexSi1−x/Si(001) surface, as well as at the initial stages of its oxidation, are considered qualitatively by analyzing the changes of unit cell dimensions occurring owing to the ad-dimer formation or the atomic or molecular adsorption on the unit cell surfaces. The stress character is found to be almost identical for the clean GexSi1−x/Si(001) surface and the GexSi1−x/Si(001) surface with adsorbed oxygen molecules or one to three adsorbed oxygen atoms. In addition, the surface stresses revealed a significant anisotropy: they turned out compressive along the dimer rows and three times as large as tensile stresses in the perpendicular direction (along the interdimer bonds).
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