Estimation of the Efficiency of Material Injection into the Reflex Discharge by Sputtering the Cathode Material

Authors

  • Yu.V. Kovtun National Science Center "Kharkiv Institute of Physics and Technology", Nat. Acad. of Sci. of Ukraine
  • E.I. Skibenko National Science Center "Kharkiv Institute of Physics and Technology", Nat. Acad. of Sci. of Ukraine
  • A.I. Skibenko National Science Center "Kharkiv Institute of Physics and Technology", Nat. Acad. of Sci. of Ukraine
  • V.B. Yuferov National Science Center "Kharkiv Institute of Physics and Technology", Nat. Acad. of Sci. of Ukraine

DOI:

https://doi.org/10.15407/ujpe57.9.901

Keywords:

-

Abstract

The processes of injection of a sputtered-and-ionized working material into the pulsed reflex discharge plasma have been considered at the initial stage of dense gas-metal plasma formation. A calculation model has been proposed to estimate the parameters of the sputtering mechanism for the required working material to be injected into the discharge. The data obtained are in good accordance with experimental results.

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Published

2012-09-30

How to Cite

Kovtun Ю., Skibenko Є., Skibenko А., & Yuferov В. (2012). Estimation of the Efficiency of Material Injection into the Reflex Discharge by Sputtering the Cathode Material. Ukrainian Journal of Physics, 57(9), 901. https://doi.org/10.15407/ujpe57.9.901

Issue

Section

Plasmas and gases