Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling
DOI:
https://doi.org/10.15407/ujpe66.5.439Keywords:
phase-field method, epitaxial growth, surface structures, electromigration, numerical simulation, statistical characteristicsAbstract
The epitaxial growth of thin films with regard for the anisotropy of the adsorbate surface diffusion induced by electromigration effects has been studied theoretically in the framework of the phase-field theory and with the use of numerical simulations. The influence of the coefficient of electromigration-induced anisotropic diffusion, which is proportional to the applied electric field strength, on the dynamics of growth of the fi lm thickness and the height of surface structures, growing surface morphology, statistical characteristics of the surface multilayer adsorbate structures, and distribution of surface structures over their heights is revealed.
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