Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling

Authors

  • A.V. Dvornichenko Sumy State University

DOI:

https://doi.org/10.15407/ujpe66.5.439

Keywords:

phase-field method, epitaxial growth, surface structures, electromigration, numerical simulation, statistical characteristics

Abstract

The epitaxial growth of thin films with regard for the anisotropy of the adsorbate surface diffusion induced by electromigration effects has been studied theoretically in the framework of the phase-field theory and with the use of numerical simulations. The influence of the coefficient of electromigration-induced anisotropic diffusion, which is proportional to the applied electric field strength, on the dynamics of growth of the fi lm thickness and the height of surface structures, growing surface morphology, statistical characteristics of the surface multilayer adsorbate structures, and distribution of surface structures over their heights is revealed.

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Published

2021-05-28

How to Cite

Dvornichenko, A. (2021). Electromigration Effects at Epitaxial Growth of Thin Films: Phase-Field Modeling. Ukrainian Journal of Physics, 66(5), 439. https://doi.org/10.15407/ujpe66.5.439

Issue

Section

Surface physics