Effects of UV Radiation on Helical Twisting in Cholesteric Systems Containing Photosensitive Azoxy Nematics
DOI:
https://doi.org/10.15407/ujpe57.2.235Keywords:
-Abstract
For cholesteric liquid crystal systems containing photosensitive nematic ZhK-440 and a mixture of cholesterol derivatives, the changes in helical twisting induced by UV radiation are studied. The UV-induced shift of the selective reflection maximum λmax is shown to depend on the concentration of the nematic component. For low concentrations of ZhK-440, λmax increases, which correlates with the corresponding temperature-induced changes. For higher azoxy nematic concentrations, λmax decreases, regardless of the temperature behavior of the system. To explain the experimental data, a theoretical description is proposed on the basis of the development of molecular models of helical twisting. Good agreement was obtained between calculated and measured values of the UV-induced shift as a function of the azoxy nematic concentration, with two extrema and an inversion point. The extra twisting arises from the cholesteric mesophase-induced orientation of short molecular axes of cis-isomers formed as a result of irradiation.
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