Effect of Nitrogen Partial Pressure on Reactive Magnetron Sputtering From Ti13Cu87 Metalloid Target: Simulation of Chemical Composition
DOI:
https://doi.org/10.15407/ujpe57.6.642Keywords:
-Abstract
A sintered Ti13Cu87 composite target was reactively sputtered in Ar–N2 gas mixtures, and sputtered species were deposited on Si (111) substrates. We study the pressure-dependent target mode variation of the Ti13Cu87–N2 system, by measuring the N2 partial pressure, deposition rate, target voltage, and Ti and Cu concentrations for various reactive N2 gas flow ratios. The Ti13Cu87 target surface begins to be nitrided with increasing N2 flow ratio, which is caused by the absorption and the implantation of N2 gas on the Ti13Cu87 target surface. Hence, the deposition rate was reduced due to the lower sputtering yield and a higher scattering under the mass transport between the target-substrate spacing. Secondary electron emission yield of the nitride portion of target
surface is higher than that of the unnitrided portion. Therefore, at a constant sputtering power, the target voltage decreases, as the N2 partial pressure increases. By means of the TRIM.SP Monte-Carlo simulation, the particle reflection coefficients of reflected neutrals was calculated. The initial energies of reflected neutrals and the sputtered particles at the substrate were estimated using the simple binary collision model and the distribution-weighted averages, respectively. Their final energies depend on the energy dissipation during the mass transport through the gas phase. The energy and angular characteristics of the sputtering yield were extracted from the available literature to obtain a prediction about a final composition of films.
References
W.D. Westwood, in Sputter Deposition (AVS, New York, 2003), Chap. 9.
K. Wasa, M. Kitabatake, and H. Adachi, Thin Film Materials Technology (Williams Andrew, Norwich, 2004).
https://doi.org/10.1016/B978-081551483-1.50002-2
Reactive Sputter Deposition, edited by D. Depla and S. Mahien (Springer, Berlin, 2008).
N. Malkomes and M.J. Vergohl, Appl. Phys. 89, 732 (2001).
https://doi.org/10.1063/1.1328407
S. Ohno, D. Sato, M. Kon, P.K. Song, M. Yoshikawa, and K. Suzuki, Thin Solid Films 445, 207 (2003).
https://doi.org/10.1016/S0040-6090(03)01152-0
E. Kusano and A. Kinbara, Thin Solid Films 281-282, 423 (1996).
https://doi.org/10.1016/0040-6090(96)08665-8
T. Kubart, O. Kapperttz, T. Nyberg, and S. Berg, Thin Solid Films 515, 421 (2006).
https://doi.org/10.1016/j.tsf.2005.12.250
The Stopping and Range of Ions in Matter, available at http://www.srim.org/.
Z. Wang, S.A. Cohen, D.N. Ruzic, and M.J. Goeckner, Phys. Rev. E 61, 1904 (2000).
https://doi.org/10.1103/PhysRevE.61.1904
S. Mahieu and D. Depla, J. Phys. D: Appl. Phys. 42, 053002 (2009).
https://doi.org/10.1088/0022-3727/42/5/053002
R. Behrisch and W. Eckstein, Sputtering by Particle Bombardment, Experiments and Computer Calculations from Threshold to MeV Energies (Springer, Berlin, 2007).
Y. Yamamura, T. Takiguchi, and M. Ishida, Radiat. Eff. Def. Sol. 118, 237 (1991).
https://doi.org/10.1080/10420159108221362
A. Palmero, H. Rudolph, and F.H.P.M. Habrakan, Appl. Phys. Lett. 89, 211501 (2006).
https://doi.org/10.1063/1.2392830
A. Rahmati, Vacuum 85, 853 (2011).
https://doi.org/10.1016/j.vacuum.2010.12.010
A. Rahmati, H. Bidadi, K. Ahmadi, and F. Hadian, Plasma Sci. Techn. 12, No.6, 1 (2010).
https://doi.org/10.1088/1009-0630/12/6/09
A. Rahmati, H. Bidadi, K. Ahmadi, and F. Hadian, J. Coat. Tech. Res. 8, 289 (2011).
https://doi.org/10.1007/s11998-010-9279-9
Y. Zhao, X. Wang, J.Q. Xiao, B. Yu, and F. Li, Appl. Surf. Sci. 258, 370 (2011).
Downloads
Published
How to Cite
Issue
Section
License
Copyright Agreement
License to Publish the Paper
Kyiv, Ukraine
The corresponding author and the co-authors (hereon referred to as the Author(s)) of the paper being submitted to the Ukrainian Journal of Physics (hereon referred to as the Paper) from one side and the Bogolyubov Institute for Theoretical Physics, National Academy of Sciences of Ukraine, represented by its Director (hereon referred to as the Publisher) from the other side have come to the following Agreement:
1. Subject of the Agreement.
The Author(s) grant(s) the Publisher the free non-exclusive right to use the Paper (of scientific, technical, or any other content) according to the terms and conditions defined by this Agreement.
2. The ways of using the Paper.
2.1. The Author(s) grant(s) the Publisher the right to use the Paper as follows.
2.1.1. To publish the Paper in the Ukrainian Journal of Physics (hereon referred to as the Journal) in original language and translated into English (the copy of the Paper approved by the Author(s) and the Publisher and accepted for publication is a constitutive part of this License Agreement).
2.1.2. To edit, adapt, and correct the Paper by approval of the Author(s).
2.1.3. To translate the Paper in the case when the Paper is written in a language different from that adopted in the Journal.
2.2. If the Author(s) has(ve) an intent to use the Paper in any other way, e.g., to publish the translated version of the Paper (except for the case defined by Section 2.1.3 of this Agreement), to post the full Paper or any its part on the web, to publish the Paper in any other editions, to include the Paper or any its part in other collections, anthologies, encyclopaedias, etc., the Author(s) should get a written permission from the Publisher.
3. License territory.
The Author(s) grant(s) the Publisher the right to use the Paper as regulated by sections 2.1.1–2.1.3 of this Agreement on the territory of Ukraine and to distribute the Paper as indispensable part of the Journal on the territory of Ukraine and other countries by means of subscription, sales, and free transfer to a third party.
4. Duration.
4.1. This Agreement is valid starting from the date of signature and acts for the entire period of the existence of the Journal.
5. Loyalty.
5.1. The Author(s) warrant(s) the Publisher that:
– he/she is the true author (co-author) of the Paper;
– copyright on the Paper was not transferred to any other party;
– the Paper has never been published before and will not be published in any other media before it is published by the Publisher (see also section 2.2);
– the Author(s) do(es) not violate any intellectual property right of other parties. If the Paper includes some materials of other parties, except for citations whose length is regulated by the scientific, informational, or critical character of the Paper, the use of such materials is in compliance with the regulations of the international law and the law of Ukraine.
6. Requisites and signatures of the Parties.
Publisher: Bogolyubov Institute for Theoretical Physics, National Academy of Sciences of Ukraine.
Address: Ukraine, Kyiv, Metrolohichna Str. 14-b.
Author: Electronic signature on behalf and with endorsement of all co-authors.
.png){kind=small}
