Study of the Distribution Oftemperature Profiles in Nonstoichiometric SiOx Films at Laser Annealing. Ukr. J. Phys. [Internet]. 2018 Oct. 24 [cited 2026 Nov. 9];59(7):712. Available from: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018499