Afanasieva T, Greenchuck A, Koval’ I, Nakhodkin M. Diffusion of Oxygen Atom Into Subsurface Layers of GexSi1-x/Si(001) Interface. Ukr. J. Phys. [Internet]. 2022 Feb. 14 [cited 2025 Apr. 24];56(4):352. Available from: https://ujp.bitp.kiev.ua/index.php/ukl/article/view/2022103