Investigation of Electrical Conductivity and Magnetoresistive Properties of Thin-Film Systems Based on Fe20Ni80 and SiO
DOI:
https://doi.org/10.15407/ujpe71.11.909Keywords:
granular thin films, discontinuous multilayers, co-evaporation, sequential condensation, magnetoresistance, regime of conductanceAbstract
This work explores the electrical conductivity and magnetoresistive properties of as-deposited and annealed at 600 K (Fe20Ni80 + SiO)/Sub granular thin films and [Fe20Ni80(d)/SiO(5)]5/Sub discontinuous multilayers. It is shown that the magnetoresistance behavior is governed by the type of thin-film sample, the heat treatment, and the composition of components. Isotropic magnetoresistance is exhibited by the as-deposited granular thin films with a magnetic component volume content of 20–70 vol.%, by the granular thin films annealed at 600 K with a magnetic component volume content of 20–40 vol.%, and by the discontinuous multilayers annealed at 600 K with an effective magnetic-layer thickness of 4–5 nm. It has been established that an exponential temperature dependence of the resistivity is observed in (Fe20Ni80 + SiO)/Sub granular thin films with a magnetic component volume content of only 20–30 vol.%. In contrast, for [Fe20Ni80(d)/SiO(5)]5/Sub discontinuous multilayers, the transition regime of conductivity is already observed at d = 3 nm.
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