1.
Bilanych BV, Shylenko O, Latyshev VM, Feher A, Bilanych VS, Rizak VM, Komanicky V. Interaction of Chalcogenide As4Se96 Films with Electron Beam When Used as Electronic Resists. Ukr. J. Phys. [Internet]. 2020 Mar. 26 [cited 2024 May 30];65(3):247. Available from: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019391