Najafov BA, Dadashova VV. Optoelectronic Properties of Thin Hydrogenated a-Si1−xGex:H (x = 0÷1) Films Produced by Plasma Chemical Deposition Technique. Ukr. J. Phys. [Internet]. 2018 Oct. 25 [cited 2024 Apr. 16];59(10):959. Available from: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018533