Hladkovskiy VV, Fedorovich OA. Spectroscopic Studies of RF Discharge Plasma at Plasma-Chemical Etching of Gallium Nitride Epitaxial Structures. Ukr. J. Phys. [Internet]. 2018 Dec. 16 [cited 2024 Jul. 22];62(3):208. Available from: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018698