Popovych, V. I., A. I. Ievtushenko, O. S. Lytvyn, V. R. Romanjuk, V. M. Tkach, V. A. Baturyn, O. Y. Karpenko, M. V. Dranchuk, L. O. Klochkov, M. G. Dushejko, V. A. Karpyna, and G. V. Lashkarov. “Effect of Argon Deposition Pressure on the Properties of Aluminum-Doped ZnO Films Deposited Layer-by-Layer Using Magnetron Sputtering”. Ukrainian Journal of Physics 61, no. 4 (January 6, 2019): 325. Accessed August 11, 2022. https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019095.