Gavrylyuk, O. O., O. Yu. Semchuk, O. V. Steblova, A. A. Evtukh, and L. L. Fedorenko. “Study of the Distribution Oftemperature Profiles in Nonstoichiometric SiOx Films at Laser Annealing”. Ukrainian Journal of Physics 59, no. 7 (October 24, 2018): 712. Accessed November 22, 2024. https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018499.