Rudenko, R. M., Voitovych, V. V., Kras’ko, M. M., Kolosyuk, A. G., Kraichynskyi, A. M., Yukhymchuk, V. O. and Makara, V. A. (2018) “Influence of High Temperature Annealing on the Structure and the Intrinsic Absorption Edge of Thin-Film Silicon Doped With Tin”, Ukrainian Journal of Physics, 58(8), p. 769. doi: 10.15407/ujpe58.08.0769.