Afanasieva Т.; Greenchuck О.; Koval’ І.; Nakhodkin М. Diffusion of Oxygen Atom Into Subsurface Layers of GexSi1-x/Si(001) Interface. Ukrainian Journal of Physics, [S. l.], v. 56, n. 4, p. 352, 2022. DOI: 10.15407/ujpe56.4.352. Disponível em: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2022103. Acesso em: 27 apr. 2024.