BILANYCH, B. V.; SHYLENKO, O.; LATYSHEV, V. M.; FEHER, A.; BILANYCH, V. S.; RIZAK, V. M.; KOMANICKY, V. Interaction of Chalcogenide As4Se96 Films with Electron Beam When Used as Electronic Resists. Ukrainian Journal of Physics, [S. l.], v. 65, n. 3, p. 247, 2020. DOI: 10.15407/ujpe65.3.247. Disponível em: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019391. Acesso em: 15 jun. 2024.