POPOVYCH, V. I.; IEVTUSHENKO, A. I.; LYTVYN, O. S.; ROMANJUK, V. R.; TKACH, V. M.; BATURYN, V. A.; KARPENKO, O. Y.; DRANCHUK, M. V.; KLOCHKOV, L. O.; DUSHEJKO, M. G.; KARPYNA, V. A.; LASHKAROV, G. V. Effect of Argon Deposition Pressure on the Properties of Aluminum-Doped ZnO Films Deposited Layer-by-Layer Using Magnetron Sputtering. Ukrainian Journal of Physics, [S. l.], v. 61, n. 4, p. 325, 2019. DOI: 10.15407/ujpe61.04.0325. Disponível em: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019095. Acesso em: 11 aug. 2022.