NAJAFOV, B. A.; DADASHOVA, V. V. Optoelectronic Properties of Thin Hydrogenated a-Si1−xGex:H (x = 0÷1) Films Produced by Plasma Chemical Deposition Technique. Ukrainian Journal of Physics, [S. l.], v. 59, n. 10, p. 959, 2018. DOI: 10.15407/ujpe59.10.0959. Disponível em: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018533. Acesso em: 28 may. 2024.