GAVRYLYUK, O. O.; SEMCHUK, O. Y.; STEBLOVA, O. V.; EVTUKH, A. A.; FEDORENKO, L. L. Study of the Distribution Oftemperature Profiles in Nonstoichiometric SiOx Films at Laser Annealing. Ukrainian Journal of Physics, [S. l.], v. 59, n. 7, p. 712, 2018. DOI: 10.15407/ujpe59.07.0712. Disponível em: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018499. Acesso em: 20 may. 2022.