RUDENKO, R. M.; VOITOVYCH, V. V.; KRAS’KO, M. M.; KOLOSYUK, A. G.; KRAICHYNSKYI, A. M.; YUKHYMCHUK, V. O.; MAKARA, V. A. Influence of High Temperature Annealing on the Structure and the Intrinsic Absorption Edge of Thin-Film Silicon Doped With Tin. Ukrainian Journal of Physics, [S. l.], v. 58, n. 8, p. 769, 2018. DOI: 10.15407/ujpe58.08.0769. Disponível em: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018349. Acesso em: 18 jun. 2024.