NEIMASH, V.; DOVBESHKO, G.; SHEPELYAVYI, P.; DANKO, V.; MELNYK, V.; ISAIEV, M.; KUZMICH, A. Raman Scattering in the Process of Tin-Induced Crystallization of Amorphous Silicon. Ukrainian Journal of Physics, [S. l.], v. 61, n. 2, p. 143, 2019. DOI: 10.15407/ujpe61.02.0143. Disponível em: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019115. Acesso em: 22 nov. 2024.