HLADKOVSKIY, V. V.; FEDOROVICH, O. A. Spectroscopic Studies of RF Discharge Plasma at Plasma-Chemical Etching of Gallium Nitride Epitaxial Structures. Ukrainian Journal of Physics, [S. l.], v. 62, n. 3, p. 208, 2018. DOI: 10.15407/ujpe62.03.0208. Disponível em: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2018698. Acesso em: 22 jul. 2024.