THONGPAN, W.; KUMPIKA, T.; KANTARAK, E.; PANTHAWAN, A.; POOSEEKHEAW, P.; SINGJAI, P.; TUANTRANONT, A.; THONGSUWAN, W. External-Electric-Field-Enhanced Uniformity and Deposition Rate of a TiO2 Film Prepared by the Sparking Process. Ukrainian Journal of Physics, [S. l.], v. 63, n. 6, p. 531, 2018. DOI: 10.15407/ujpe63.6.531. Disponível em: https://ujp.bitp.kiev.ua/index.php/ujp/article/view/117. Acesso em: 23 nov. 2024.