Rudenko, R. M., Kras’ko, M. M., Voitovych, V. V., Kolosyuk, A. G., Povarchuk, V. Y., Kraichynskyi, A. M., Yukhymchuck, V. O., Bratus’, V. Y., Voitovych, M. V., & Zaloilo, I. A. (2018). Behavior of Hydrogen During Crystallization of Thin Silicon Films Doped with Tin. Ukrainian Journal of Physics, 58(12), 1165. https://doi.org/10.15407/ujpe58.12.1165