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Popovych, V. I.; Ievtushenko, A. I.; Lytvyn, O. S.; Romanjuk, V. R.; Tkach, V. M.; Baturyn, V. A.; Karpenko, O. Y.; Dranchuk, M. V.; Klochkov, L. O.; Dushejko, M. G.; Karpyna, V. A.; Lashkarov, G. V. Effect of Argon Deposition Pressure on the Properties of Aluminum-Doped ZnO Films Deposited Layer-by-Layer Using Magnetron Sputtering. Ukr. J. Phys. 2019, 61, 325.