Popovych, V.I., Ievtushenko, A.I., Lytvyn, O.S., Romanjuk, V.R., Tkach, V.M., Baturyn, V.A., Karpenko, O.Y., Dranchuk, M.V., Klochkov, L.O., Dushejko, M.G., Karpyna, V.A. and Lashkarov, G.V. 2019. Effect of Argon Deposition Pressure on the Properties of Aluminum-Doped ZnO Films Deposited Layer-by-Layer Using Magnetron Sputtering. Ukrainian Journal of Physics. 61, 4 (Jan. 2019), 325. DOI:https://doi.org/10.15407/ujpe61.04.0325.