Gavrylyuk, O.O., Semchuk, O.Y., Steblova, O.V., Evtukh, A.A. and Fedorenko, L.L. 2018. Study of the Distribution Oftemperature Profiles in Nonstoichiometric SiOx Films at Laser Annealing. Ukrainian Journal of Physics. 59, 7 (Oct. 2018), 712. DOI:https://doi.org/10.15407/ujpe59.07.0712.