Rudenko, R.M., Voitovych, V.V., Kras’ko, M.M., Kolosyuk, A.G., Kraichynskyi, A.M., Yukhymchuk, V.O. and Makara, V.A. 2018. Influence of High Temperature Annealing on the Structure and the Intrinsic Absorption Edge of Thin-Film Silicon Doped With Tin. Ukrainian Journal of Physics. 58, 8 (Oct. 2018), 769. DOI:https://doi.org/10.15407/ujpe58.08.0769.