TY - JOUR AU - Lysenko, I. O. PY - 2019/01/05 Y2 - 2024/03/28 TI - Analysis of the Formation of Stationary Patterns at the Ion Sputtering within the Anisotropic Kuramoto–Sivashinsky Model JF - Ukrainian Journal of Physics JA - Ukr. J. Phys. VL - 61 IS - 7 SE - Solid matter DO - 10.15407/ujpe61.07.0588 UR - https://ujp.bitp.kiev.ua/index.php/ujp/article/view/2019061 SP - 588 AB - <p>The processes of change of a surface morphology and formation of a stationary pattern at the ion sputtering are considered. A linear stability analysis was carried out, and the range of parameters, at which the patterning is possible, is determined. Assuming the existence of a stabilization parameter that involves the redistribution of knocked-out atoms, all evolution scenarios for the surface are obtained numerically. The dynamics of defects is numerically analyzed for every structure type, and the corresponding time dependences are plotted.</p> ER -