Структурні та морфологічні властивості нанометрових вуглецевих плівок, отриманих розпиленням графіту електронним променем

V.O. Yukhymchuk; V.M. Dzhagan; O.F. Isaieva; P.M. Lytvyn; A.A. Korchovyi; T.M. Sabov; V.B. Lozinskii; V.S. Yefanov; V.O. Osokin; Yu.A. Kurapov

doi:10.15407/ujpe68.11.764

Structural and Morphological Properties of Nanometer Carbon Films Obtained by Electron Beam Sputtering of Graphite

Authors

V.O. Yukhymchuk V.Ye. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine https://orcid.org/0000-0002-5218-9154
V.M. Dzhagan V.Ye. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine https://orcid.org/0000-0002-7839-9862
O.F. Isaieva V.Ye. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine https://orcid.org/0000-0003-1313-5409
P.M. Lytvyn V.Ye. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine https://orcid.org/0000-0002-0131-9860
A.A. Korchovyi V.Ye. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine https://orcid.org/0000-0002-8848-7049
T.M. Sabov V.Ye. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine https://orcid.org/0000-0003-2636-2379
V.B. Lozinskii V.Ye. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine https://orcid.org/0000-0002-7787-0456
V.S. Yefanov V.Ye. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine https://orcid.org/0000-0001-5408-1086
V.O. Osokin Ye.O. Paton Electric Welding Institute, Nat. Acad. of Sci. of Ukraine https://orcid.org/0000-0002-0632-7739
Yu.A. Kurapov Ye.O. Paton Electric Welding Institute, Nat. Acad. of Sci. of Ukraine

DOI:

https://doi.org/10.15407/ujpe68.11.764

Keywords:

AFM, carbon amorphous films, electron sputtering, graphite-like films, Raman spectroscopy, XPS

Abstract

Nanometer-thick carbon films on metal (copper, steel) and silicon substrates are obtained by the electron sputtering of graphite. The substrate temperature was varied from 350 to 600 ^оС with an increment of 50 ^оС, and the sputtering time from 1 to 10 s. The produced carbon films are studied using Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), atomic force microscopy, and electron paramagnetic resonance (EPR) spectroscopy. From the analysis of Raman spectra, it is found that, at the temperatures of metal substrates below 550 ^оС, the carbon films formed on them are amorphous and have a graphite-like structure at higher substrate temperatures. At the same time, the films formed on silicon substrates at temperatures below 600 ^оС are amorphous. The results obtained from the Raman spectra correlate with the XPS data. It is shown that both the temperature and the substrate material (metal or silicon) affect the film morphology. As the substrate temperature increases from 350 to 600 ^оС, the average size of surface irregularities increases for carbon films on both the metal and silicon substrates. The EPR studies show that the available structural film defects, which are responsible for the manifestation of the so-called defect bands (D and D′ ones) in the Raman spectra, are not paramagnetic.

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Published

2023-12-18

How to Cite

Yukhymchuk, V., Dzhagan, V., Isaieva, O., Lytvyn, P., Korchovyi, A., Sabov, T., Lozinskii, V., Yefanov, V., Osokin, V., & Kurapov, Y. (2023). Structural and Morphological Properties of Nanometer Carbon Films Obtained by Electron Beam Sputtering of Graphite. Ukrainian Journal of Physics, 68(11), 764. https://doi.org/10.15407/ujpe68.11.764

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Issue

Vol. 68 No. 11 (2023)

Section

Semiconductors and dielectrics

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