Influence of the HF Vapor Treatment on the Structure and Luminescence Properties of Porous Si/SiOx Nanocomposites

Authors

  • V.A. Dan’ko V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
  • S.O. Zlobin V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
  • I.Z. Indutnyi V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
  • I.P. Lisovskyy V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
  • L.G. Litovchenko V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
  • K.V. Michailovska V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
  • P.E. Shepeliavyi V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine

DOI:

https://doi.org/10.15407/ujpe55.9.1038

Keywords:

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Abstract

By methods of IR-spectroscopy and photoluminescence, we studied the influence of the etching of the oxide matrix of porous nanocomposite Si/SiO

References

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Published

2025-01-22

How to Cite

Dan’ko, V., Zlobin, S., Indutnyi, I., Lisovskyy, I., Litovchenko, L., Michailovska, K., & Shepeliavyi, P. (2025). Influence of the HF Vapor Treatment on the Structure and Luminescence Properties of Porous Si/SiOx Nanocomposites. Ukrainian Journal of Physics, 55(9), 1038. https://doi.org/10.15407/ujpe55.9.1038

Issue

Vol. 55 No. 9 (2010)

Section

Nanosystems

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