Deposition of Metal Films on Microparticles Trapped in RF Magnetron Discharge
DOI:
https://doi.org/10.15407/ujpe56.12.1315Keywords:
-Abstract
The technique for a metal film deposition on spherical microparticles in an RF plasma trap is presented. Both the particle confinement and the electrode sputtering are performed by a single RF magnetron discharge. The samples of a coated spheres are obtained and examined. The technique allows confining the particles near to the sputtered region close to the border zone of ballistic bombardment by sputtered atoms.
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