Mechanisms of Surface Evolution During the Growth of Undoped Nanosilicon Films
DOI:
https://doi.org/10.15407/ujpe60.02.0165Keywords:
nanosilicon films, surface roughness, grain growth, mechanism of grain growth, atomic force microscopyAbstract
The thickness dependence of the surface roughness and the grain size of nanosilicon films, produced by low-pressure chemical vapour deposition, has been found, by using atomic force microscopy. A correlation between the surface roughness, grain size, and transformation of a film structure from the equiaxial structure into a fibrous one is established. Possible mechanisms of surface evolution are analyzed.
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Kyiv, Ukraine
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