Mechanisms of Surface Evolution During the Growth of Undoped Nanosilicon Films

  • N. G. Nakhodkin Taras Shevchenko National University of Kyiv
  • T. V. Rodionova Taras Shevchenko National University of Kyiv
  • A. S. Sutyagina Taras Shevchenko National University of Kyiv
Keywords: nanosilicon films, surface roughness, grain growth, mechanism of grain growth, atomic force microscopy

Abstract

The thickness dependence of the surface roughness and the grain size of nanosilicon films, produced by low-pressure chemical vapour deposition, has been found, by using atomic force microscopy. A correlation between the surface roughness, grain size, and transformation of a film structure from the equiaxial structure into a fibrous one is established. Possible mechanisms of surface evolution are analyzed.

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Published
2019-01-22
How to Cite
Nakhodkin, N., Rodionova, T., & Sutyagina, A. (2019). Mechanisms of Surface Evolution During the Growth of Undoped Nanosilicon Films. Ukrainian Journal of Physics, 60(2), 165. https://doi.org/10.15407/ujpe60.02.0165
Section
Nanosystems