Analysis of the Formation of Stationary Patterns at the Ion Sputtering within the Anisotropic Kuramoto–Sivashinsky Model

  • I. O. Lysenko Institute of Applied Physics, Nat. Acad. of Sci. of Ukraine
Keywords: ion sputtering, pattern formation, stationary patterns, heavy ions, ion flux, defect, hexagonal structures, linear structures

Abstract

The processes of change of a surface morphology and formation of a stationary pattern at the ion sputtering are considered. A linear stability analysis was carried out, and the range of parameters, at which the patterning is possible, is determined. Assuming the existence of a stabilization parameter that involves the redistribution of knocked-out atoms, all evolution scenarios for the surface are obtained numerically. The dynamics of defects is numerically analyzed for every structure type, and the corresponding time dependences are plotted.

Published
2019-01-05
How to Cite
Lysenko, I. (2019). Analysis of the Formation of Stationary Patterns at the Ion Sputtering within the Anisotropic Kuramoto–Sivashinsky Model. Ukrainian Journal of Physics, 61(7), 588. https://doi.org/10.15407/ujpe61.07.0588
Section
Solid matter