Destruction of Nano-Inhomogeneities of the Surface of Dielectrics Using the Optical Near-Field
DOI:
https://doi.org/10.15407/ujpe62.09.0763Keywords:
subnano-polishing, destruction, dipole-dipole interaction, photodissociation, optical near-field, evanescent waveAbstract
The destruction of surface nano-inhomogeneities of a quartz substrate using the optical near-field dipole-dipole interaction of atomic chlorine with SiO2 is studied. A method to obtain atomic chlorine by the local photodissociation of molecular chlorine by the optical near-field of the quartz substrate nano-inhomogeneities is proposed. The polarization of chlorine atoms and SiO2 by means of an evanescent wave, which is generated on the substrate surface, is investigated. A method is proposed to obtain the most optimal orientation of the dipoles of atomic chlorine and SiO2, using the features of the optical near-field, to maximally efficiently destroy the quartz substrate nano-inhomogeneities. The application of the composite quasiparticle model describing the optical near-field interaction of dipoles is considered.
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Kyiv, Ukraine
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