Behavior of Hydrogen During Crystallization of Thin Silicon Films Doped with Tin

R. M. Rudenko; M. M. Kras’ko; V. V. Voitovych; A. G. Kolosyuk; V. Yu. Povarchuk; A. M. Kraichynskyi; V. O. Yukhymchuck; V. Ya. Bratus’; M. V. Voitovych; I. A. Zaloilo

doi:10.15407/ujpe58.12.1165

Behavior of Hydrogen During Crystallization of Thin Silicon Films Doped with Tin

Authors

R. M. Rudenko Taras Shevchenko National University of Kyiv, Faculty of Physics
M. M. Kras’ko Institute of Physics, Nat. Acad. of Sci. of Ukraine
V. V. Voitovych Institute of Physics, Nat. Acad. of Sci. of Ukraine
A. G. Kolosyuk Institute of Physics, Nat. Acad. of Sci. of Ukraine
V. Yu. Povarchuk Institute of Physics, Nat. Acad. of Sci. of Ukraine
A. M. Kraichynskyi Institute of Physics, Nat. Acad. of Sci. of Ukraine
V. O. Yukhymchuck V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
V. Ya. Bratus’ V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
M. V. Voitovych V.E. Lashkaryov Institute of Semiconductor Physics, Nat. Acad. of Sci. of Ukraine
I. A. Zaloilo National University of Life and Environmental Sciences of Ukraine

DOI:

https://doi.org/10.15407/ujpe58.12.1165

Keywords:

thin silicon ﬁlms, crystallization, tin doping, hydrogen

Abstract

The behavior of a hydrogen impurity in the course of crystallization of thin silicon ﬁlms doped with tin (a-SiSn ﬁlms) has been studied. It is found that the band located at about 2000–2200 cm^−1 and corresponding to the IR absorption at silicon–hydrogen bonds is absent from the spectra of as-deposited (at a temperature of 300 ◦C) a-SiSn ﬁlms with Sn contents within the interval of 1–10 at.%. In undoped thin silicon ﬁlms (a-Si ﬁlms), the hydrogen content diminishes below the sensitivity threshold of the measurement technique only after the annealing of the specimens at 700 ◦C. The absence of hydrogen in a-SiSn ﬁlms is in good agreement with the results of EPR studies and the results of Raman scattering studies of structural transformations in thermally treated ﬁlms. It is shown that the formation of crystalline phases in a-SiSn occurs at lower temperatures as compared to those in a-Si, with a correlation taking place between the crystallization temperature for Si clusters and the concentration of the tin impurity. Taking into account that tin reduces the temperature of the hydrogen eﬀusion from the ﬁlm volume and, accordingly, stimulates the ordering in the specimen structure, it is possible to consider that hydrogen impurity takes part in the processes that result in a decrease of the crystallization temperature for a-SiSn.

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Published

2018-10-11

How to Cite

Rudenko, R. M., Kras’ko, M. M., Voitovych, V. V., Kolosyuk, A. G., Povarchuk, V. Y., Kraichynskyi, A. M., Yukhymchuck, V. O., Bratus’, V. Y., Voitovych, M. V., & Zaloilo, I. A. (2018). Behavior of Hydrogen During Crystallization of Thin Silicon Films Doped with Tin. Ukrainian Journal of Physics, 58(12), 1165. https://doi.org/10.15407/ujpe58.12.1165

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Issue

Vol. 58 No. 12 (2013)

Section

Solid matter

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