Modeling of Gas Discharge in Water Vapor

  • A. A. General Institute of Electron Physics, Nat. Acad. of Sci. of Ukraine
  • Yu. O. Shpenik Institute of Electron Physics, Nat. Acad. of Sci. of Ukraine
Keywords: gas discharge, radical, rate constant

Abstract

The results of our study of a gas-discharge plasma in water vapor are reported. The generation rate of excited OH* (A2Σ+) radicals in the water vapor discharge turns out significantly higher than the formation rate of emitting states of hydrogen and oxygen atoms. According to our estimations, the optimum value of E=N-ratio between the electric field strength E and the concentration of gas particles N for the excitation of radical OH* bands equals (300 -- 400)x10^-21 V*m2.
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Published
2018-10-05
How to Cite
General, A., & Shpenik, Y. (2018). Modeling of Gas Discharge in Water Vapor. Ukrainian Journal of Physics, 58(2), 116. https://doi.org/10.15407/ujpe58.02.0116
Section
Optics, lasers, and quantum electronics