External-Electric-Field-Enhanced Uniformity and Deposition Rate of a TiO2 Film Prepared by the Sparking Process

  • W. Thongpan PhD’s Degree Program in Applied Physics, Faculty of Science, Chiang Mai University, Department of Physics and Materials Science, Faculty of Science, Chiang Mai University
  • T. Kumpika Department of Physics and Materials Science, Faculty of Science, Chiang Mai University
  • E. Kantarak Department of Physics and Materials Science, Faculty of Science, Chiang Mai University
  • A. Panthawan Department of Physics and Materials Science, Faculty of Science, Chiang Mai University
  • P. Pooseekheaw Department of Physics and Materials Science, Faculty of Science, Chiang Mai University
  • P. Singjai Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Materials Science Research Center, Faculty of Science, Chiang Mai University, Center of Advanced Materials of Printed Electronics and Sensors, Materials Science Research Center, Faculty of Science, Chiang Mai University
  • A. Tuantranont Center of Advanced Materials of Printed Electronics and Sensors, Materials Science Research Center, Faculty of Science, Chiang Mai University, Thailand Organic and Printed Electronics Innovation Center, National Electronics and Computer Technology Center, National Science and Technology, Development Agency
  • W. Thongsuwan Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Materials Science Research Center, Faculty of Science, Chiang Mai University, Center of Advanced Materials of Printed Electronics and Sensors, Materials Science Research Center, Faculty of Science, Chiang Mai University
Keywords: TiO2 film, sparking process, external electric fields

Abstract

We have used an external electric field to increase both the uniformity and deposition rate of TiO2 films. The experiment is carried out by sparking-off titanium wires with a high dc voltage of 1 kV (field Eint = 10 kV/cm) and a limited current of 3 mA. The external electric fields (Eext) of 3, 6, and 9 kV/cm were applied to the sparking system for 1–5 hours. The as-deposited film morphology was characterized by scanning electron microscopy. The results clearly show that the films are only deposited on the external electric field area. Furthermore, the deposition rate of the films increased from 40.7% to 77.8% in the presence of the external electric field of 9 kV/cm. The effects of an external electric field on both the deposition rate and uniformity of films are investigated and described.

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Published
2018-07-12
How to Cite
Thongpan, W., Kumpika, T., Kantarak, E., Panthawan, A., Pooseekheaw, P., Singjai, P., Tuantranont, A., & Thongsuwan, W. (2018). External-Electric-Field-Enhanced Uniformity and Deposition Rate of a TiO2 Film Prepared by the Sparking Process. Ukrainian Journal of Physics, 63(6), 531. https://doi.org/10.15407/ujpe63.6.531
Section
Surface physics